Fabrication of SiC membrane HCG blue reflector using nanoimprint lithography

Ying-Yu Lai; Akihiro Matsutani; Tien-Chang Lu; Shing-Chung Wang; Fumio Koyama

doi:10.1117/12.2077391

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27 February 2015 Fabrication of SiC membrane HCG blue reflector using nanoimprint lithography

Ying-Yu Lai, Akihiro Matsutani, Tien-Chang Lu, Shing-Chung Wang, Fumio Koyama

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Proceedings Volume 9372, High Contrast Metastructures IV; 937207 (2015) https://doi.org/10.1117/12.2077391
Event: SPIE OPTO, 2015, San Francisco, California, United States

Abstract

We designed and fabricated a suspended SiC-based membrane high contrast grating (HCG) reflectors. The rigorous coupled-wave analysis (RCWA) was employed to verify the structural parameters including grating periods, grating height, filling factors and air-gap height. From the optimized simulation results, the designed SiC-based membrane HCG has a wide reflection stopband (reflectivity (R) <90%) of 135 nm for the TE polarization, which centered at 480 nm. The suspended SiC-based membrane HCG reflectors were fabricated by nanoimprint lithography and two-step etching technique. The corresponding reflectivity was measured by using a micro-reflectivity spectrometer. The experimental results show a high reflectivity (R<90%), which is in good agreement with simulation results. This achievement should have an impact on numerous III-N based photonic devices operating in the blue wavelength or even ultraviolet region.

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Ying-Yu Lai, Akihiro Matsutani, Tien-Chang Lu, Shing-Chung Wang, and Fumio Koyama "Fabrication of SiC membrane HCG blue reflector using nanoimprint lithography", Proc. SPIE 9372, High Contrast Metastructures IV, 937207 (27 February 2015); https://doi.org/10.1117/12.2077391

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