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13 March 2015 Electron beam written subwavelength gratings for polarization separation in the infrared
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Abstract
The design and fabrication of transmission subwavelength binary gratings for operation as polarizing beam splitters (PBSs) at 1550 nm is presented in this paper. An analytical method called the modal method was used for the design as well as to predict the efficiencies of the polarization components in each order. Electron beam lithography has been employed to fabricate the subwavelength grating structures on poly methyl methacrylate (PMMA). The performance of the fabricated PBS has been evaluated by optical testing.
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V. Pramitha, M. S. Gayathri, and Shanti Bhattacharya "Electron beam written subwavelength gratings for polarization separation in the infrared", Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 937412 (13 March 2015); https://doi.org/10.1117/12.2078607
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