22 October 2014 Detection of microwave radiation on porous silicon nanostructures
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Proceedings Volume 9421, Eighth International Conference on Advanced Optical Materials and Devices (AOMD-8); 942103 (2014) https://doi.org/10.1117/12.2083575
Event: Eighth International Conference on Advanced Optical Materials and Devices, 2014, Riga, Latvia
Abstract
We report on possibility to detect pulsed microwave radiation across the metal/oxide/porous silicon structures and analyse possible physical reasons causing the rise of the emf voltage signal. The n-type porous layers were fabricated according to conventional electrochemical etching procedure, and were exposed to pulsed 10 GHz microwave radiation. The results of investigation show that the porous Si samples have higher by at least one order voltage-to-power sensitivity than the samples without the porous layer, and are considered to have high potential to increase it further. Free carrier heating phenomenon is considered to be responsible for the signal formation.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Gradauskas, J. Stupakova, A. Sužiedėlis, N. Samuoliene, "Detection of microwave radiation on porous silicon nanostructures", Proc. SPIE 9421, Eighth International Conference on Advanced Optical Materials and Devices (AOMD-8), 942103 (22 October 2014); doi: 10.1117/12.2083575; https://doi.org/10.1117/12.2083575
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