Visit My Account to manage your email alerts.
Toward 10nm half-pitch in EUV lithography: results on resist screening and pattern collapse mitigation techniques
Relationship between information and energy carried by extreme-ultraviolet photons: consideration from the viewpoint of sensitivity enhancement
Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography
Novel resist approaches to enable EUV lithography in high volume manufacturing and extensions to future nodes
Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography
Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach
Directed self assembly on resist-limited guiding patterns for hole grapho-epitaxy: Can DSA help lower EUV's source power requirements?
First results of outgas resist family test and correlation between outgas specifications and EUV resist development
Correlation of actinic blank inspection and experimental phase defect printability on NXE3x00 EUV scanner
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders