Visit My Account to manage your email alerts.
Toward 10nm half-pitch in EUV lithography: results on resist screening and pattern collapse mitigation techniques
Relationship between information and energy carried by extreme-ultraviolet photons: consideration from the viewpoint of sensitivity enhancement
Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography
Novel resist approaches to enable EUV lithography in high volume manufacturing and extensions to future nodes
Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography
Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach
Directed self assembly on resist-limited guiding patterns for hole grapho-epitaxy: Can DSA help lower EUV's source power requirements?
First results of outgas resist family test and correlation between outgas specifications and EUV resist development
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
Measurement of the phase defect size using scanning probe microscope and at-wavelength inspection tool
Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope
Effects of low-molecular weight resist components on dissolution behavior of chemically amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance