16 March 2015 Performance optimization of MOPA pre-pulse LPP light source
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This paper describes the development and evolution of the critical architecture for a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing (HVM). In this paper we discuss the most recent results from high power sources in the field and testing on our laboratory based development systems, and describe the requirements and technical challenges related to successful implementation of those technologies on production sources. System performance is shown, focusing on pre-pulse operation with high conversion efficiency (CE) and with dose control to ensure high die yield. Finally, experimental results evaluating technologies for generating stable EUV power output for a high volume manufacturing (HVM) LPP source will be reviewed.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander A. Schafgans, Daniel J. Brown, Igor V. Fomenkov, Rick Sandstrom, Alex Ershov, Georgiy Vaschenko, Rob Rafac, Michael Purvis, Slava Rokitski, Yezheng Tao, Daniel J. Riggs, Wayne J. Dunstan, Matthew Graham, Nigel R. Farrar, David C. Brandt, Norbert Böwering, Alberto Pirati, Noreen Harned, Christian Wagner, Hans Meiling, Ron Kool, "Performance optimization of MOPA pre-pulse LPP light source", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220B (16 March 2015); doi: 10.1117/12.2087421; https://doi.org/10.1117/12.2087421

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