16 March 2015 Performance optimization of MOPA pre-pulse LPP light source
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Abstract
This paper describes the development and evolution of the critical architecture for a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing (HVM). In this paper we discuss the most recent results from high power sources in the field and testing on our laboratory based development systems, and describe the requirements and technical challenges related to successful implementation of those technologies on production sources. System performance is shown, focusing on pre-pulse operation with high conversion efficiency (CE) and with dose control to ensure high die yield. Finally, experimental results evaluating technologies for generating stable EUV power output for a high volume manufacturing (HVM) LPP source will be reviewed.
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Alexander A. Schafgans, Alexander A. Schafgans, Daniel J. Brown, Daniel J. Brown, Igor V. Fomenkov, Igor V. Fomenkov, Rick Sandstrom, Rick Sandstrom, Alex Ershov, Alex Ershov, Georgiy Vaschenko, Georgiy Vaschenko, Rob Rafac, Rob Rafac, Michael Purvis, Michael Purvis, Slava Rokitski, Slava Rokitski, Yezheng Tao, Yezheng Tao, Daniel J. Riggs, Daniel J. Riggs, Wayne J. Dunstan, Wayne J. Dunstan, Matthew Graham, Matthew Graham, Nigel R. Farrar, Nigel R. Farrar, David C. Brandt, David C. Brandt, Norbert Böwering, Norbert Böwering, Alberto Pirati, Alberto Pirati, Noreen Harned, Noreen Harned, Christian Wagner, Christian Wagner, Hans Meiling, Hans Meiling, Ron Kool, Ron Kool, } "Performance optimization of MOPA pre-pulse LPP light source", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220B (16 March 2015); doi: 10.1117/12.2087421; https://doi.org/10.1117/12.2087421
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