16 March 2015 Sub-aperture EUV collector with dual-wavelength spectral purity filter
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Abstract
The combination of a 10.6 μm main pulse CO2 laser and a 1064 nm pre-pulse Nd:YAG laser in EUV source concepts for HVM would require collector mirrors with an integrated spectral purity filter that suppresses both laser wavelengths. This paper discusses a new approach of a dual-wavelength spectral purity filter to suppress 10.6 μm and 1064 nm IR radiation at the same time. The dual-wavelength spectral purity filter combines two binary phase gratings that are optimized for 10.6 μm and 1064 nm, respectively. The dual phase grating structure has been realized on spherical sub-aperture EUV collector mirrors having an outer diameter of 150 mm. IR suppression factors of 260 at 10.6 μm and 620 at 1064 nm have been measured on the sub-aperture EUV collector while its EUV reflectance exceeded 64 % at 13.5 nm.
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Torsten Feigl, Torsten Feigl, Marco Perske, Marco Perske, Hagen Pauer, Hagen Pauer, Tobias Fiedler, Tobias Fiedler, Uwe Zeitner, Uwe Zeitner, Robert Leitel, Robert Leitel, Hans-Christoph Eckstein, Hans-Christoph Eckstein, Philipp Schleicher, Philipp Schleicher, Sven Schröder, Sven Schröder, Marcus Trost, Marcus Trost, Stefan Risse, Stefan Risse, Ralf Steinkopf, Ralf Steinkopf, Frank Scholze, Frank Scholze, Christian Laubis, Christian Laubis, } "Sub-aperture EUV collector with dual-wavelength spectral purity filter", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220E (16 March 2015); doi: 10.1117/12.2175666; https://doi.org/10.1117/12.2175666
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