Sub-aperture EUV collector with dual-wavelength spectral purity filter

Torsten Feigl; Marco Perske; Hagen Pauer; Tobias Fiedler; Uwe Zeitner; Robert Leitel; Hans-Christoph Eckstein; Philipp Schleicher; Sven Schröder; Marcus Trost; Stefan Risse; Ralf Steinkopf; Frank Scholze; Christian Laubis

doi:10.1117/12.2175666

16 March 2015 Sub-aperture EUV collector with dual-wavelength spectral purity filter

Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Uwe Zeitner, Robert Leitel, Hans-Christoph Eckstein, Philipp Schleicher, Sven Schröder, Marcus Trost, Stefan Risse, Ralf Steinkopf, Frank Scholze, Christian Laubis

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94220E (2015) https://doi.org/10.1117/12.2175666
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The combination of a 10.6 μm main pulse CO₂laser and a 1064 nm pre-pulse Nd:YAG laser in EUV source concepts for HVM would require collector mirrors with an integrated spectral purity filter that suppresses both laser wavelengths. This paper discusses a new approach of a dual-wavelength spectral purity filter to suppress 10.6 μm and 1064 nm IR radiation at the same time. The dual-wavelength spectral purity filter combines two binary phase gratings that are optimized for 10.6 μm and 1064 nm, respectively. The dual phase grating structure has been realized on spherical sub-aperture EUV collector mirrors having an outer diameter of 150 mm. IR suppression factors of 260 at 10.6 μm and 620 at 1064 nm have been measured on the sub-aperture EUV collector while its EUV reflectance exceeded 64 % at 13.5 nm.

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Torsten Feigl, Torsten Feigl, Marco Perske, Marco Perske, Hagen Pauer, Hagen Pauer, Tobias Fiedler, Tobias Fiedler, Uwe Zeitner, Uwe Zeitner, Robert Leitel, Robert Leitel, Hans-Christoph Eckstein, Hans-Christoph Eckstein, Philipp Schleicher, Philipp Schleicher, Sven Schröder, Sven Schröder, Marcus Trost, Marcus Trost, Stefan Risse, Stefan Risse, Ralf Steinkopf, Ralf Steinkopf, Frank Scholze, Frank Scholze, Christian Laubis, Christian Laubis, "Sub-aperture EUV collector with dual-wavelength spectral purity filter", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220E (16 March 2015); doi: 10.1117/12.2175666; https://doi.org/10.1117/12.2175666

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