16 March 2015 Sub-aperture EUV collector with dual-wavelength spectral purity filter
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The combination of a 10.6 μm main pulse CO2 laser and a 1064 nm pre-pulse Nd:YAG laser in EUV source concepts for HVM would require collector mirrors with an integrated spectral purity filter that suppresses both laser wavelengths. This paper discusses a new approach of a dual-wavelength spectral purity filter to suppress 10.6 μm and 1064 nm IR radiation at the same time. The dual-wavelength spectral purity filter combines two binary phase gratings that are optimized for 10.6 μm and 1064 nm, respectively. The dual phase grating structure has been realized on spherical sub-aperture EUV collector mirrors having an outer diameter of 150 mm. IR suppression factors of 260 at 10.6 μm and 620 at 1064 nm have been measured on the sub-aperture EUV collector while its EUV reflectance exceeded 64 % at 13.5 nm.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Torsten Feigl, Torsten Feigl, Marco Perske, Marco Perske, Hagen Pauer, Hagen Pauer, Tobias Fiedler, Tobias Fiedler, Uwe Zeitner, Uwe Zeitner, Robert Leitel, Robert Leitel, Hans-Christoph Eckstein, Hans-Christoph Eckstein, Philipp Schleicher, Philipp Schleicher, Sven Schröder, Sven Schröder, Marcus Trost, Marcus Trost, Stefan Risse, Stefan Risse, Ralf Steinkopf, Ralf Steinkopf, Frank Scholze, Frank Scholze, Christian Laubis, Christian Laubis, "Sub-aperture EUV collector with dual-wavelength spectral purity filter", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220E (16 March 2015); doi: 10.1117/12.2175666; https://doi.org/10.1117/12.2175666


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