13 March 2015 Towards production ready processing with a state-of-the-art EUV cluster
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EUV lithography is one of the main candidates for enabling the next generation of devices, primarily by enabling a lithography process that reduces complexity, and eventually, cost. IBM has installed the latest tool sets at the IBM EUV Center of Excellence in Albany to accelerate EUV lithography development for production use. Though the EUV cluster is capable of enabling the pitch requirements for the 7nm node, the dimensions in question represent a new regime in defectivity. Additionally, new classes of patterning materials are being explored, for which there is very little known up-front regarding known defect mechanisms. We will discuss the baseline cluster performance and the improvement strategy in terms of defectivity and pattern collapse in this paper by utilizing coater/developer techniques based on the new platform.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karen Petrillo, Karen Petrillo, Nicole Saulnier, Nicole Saulnier, Richard Johnson, Richard Johnson, Luciana Meli, Luciana Meli, Chris Robinson, Chris Robinson, Chiew-seng Koay, Chiew-seng Koay, Nelson Felix, Nelson Felix, Daniel Corliss, Daniel Corliss, Matthew Colburn, Matthew Colburn, Takashi Saito, Takashi Saito, Lior Huli, Lior Huli, David Hetzer, David Hetzer, Hiroie Matsumoto, Hiroie Matsumoto, Andrew Metz, Andrew Metz, Yudai Hira, Yudai Hira, "Towards production ready processing with a state-of-the-art EUV cluster", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220R (13 March 2015); doi: 10.1117/12.2085894; https://doi.org/10.1117/12.2085894

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