We present first results on the polarization properties of EUV multilayer mirrors close to the Brewster angle where polarization selectivity up to s104 is predicted from model calculations. We also present polarization resolved measurements of the EUV diffraction of absorber line patterns at EUV photomasks. |
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CITATIONS
Cited by 2 scholarly publications.
Extreme ultraviolet
Polarization
Reflectivity
Mirrors
Diffraction
Photomasks
Metrology