We present first results on the polarization properties of EUV multilayer mirrors close to the Brewster angle where polarization selectivity up to s104 is predicted from model calculations. We also present polarization resolved measurements of the EUV diffraction of absorber line patterns at EUV photomasks.
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Victor Soltwisch, Andreas Fischer, Christian Laubis, Christian Stadelhoff, Frank Scholze, Albrecht Ullrich, "Polarization resolved measurements with the new EUV ellipsometer of PTB," Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942213 (13 March 2015);