16 March 2015 A method of image-based aberration metrology for EUVL tools
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Abstract
We present an approach to image-based EUV aberration metrology using binary mask targets and iterative model-based solutions to extract both the amplitude and phase components of the aberrated pupil function. The approach is enabled through previously developed modeling, fitting, and extraction algorithms. We examine the flexibility and criticality of the method using two experimental case studies. The first extracts the pupil phase behavior from an ASML NXE:3100 exposure system and shows primary aberration sensitivity below 0.2 mλ. The second experiment extracts both components of the pupil function from the SHARP EUV microscope.
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Zac Levinson, Sudharshanan Raghunathan, Erik Verduijn, Obert Wood, Pawitter Mangat, Kenneth Goldberg, Markus Benk, Antoine Wojdyla, Vicky Philipsen, Eric Hendrickx, Bruce W. Smith, "A method of image-based aberration metrology for EUVL tools", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942215 (16 March 2015); doi: 10.1117/12.2087177; https://doi.org/10.1117/12.2087177
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