16 March 2015 A method of image-based aberration metrology for EUVL tools
Author Affiliations +
We present an approach to image-based EUV aberration metrology using binary mask targets and iterative model-based solutions to extract both the amplitude and phase components of the aberrated pupil function. The approach is enabled through previously developed modeling, fitting, and extraction algorithms. We examine the flexibility and criticality of the method using two experimental case studies. The first extracts the pupil phase behavior from an ASML NXE:3100 exposure system and shows primary aberration sensitivity below 0.2 mλ. The second experiment extracts both components of the pupil function from the SHARP EUV microscope.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zac Levinson, Zac Levinson, Sudharshanan Raghunathan, Sudharshanan Raghunathan, Erik Verduijn, Erik Verduijn, Obert Wood, Obert Wood, Pawitter Mangat, Pawitter Mangat, Kenneth Goldberg, Kenneth Goldberg, Markus Benk, Markus Benk, Antoine Wojdyla, Antoine Wojdyla, Vicky Philipsen, Vicky Philipsen, Eric Hendrickx, Eric Hendrickx, Bruce W. Smith, Bruce W. Smith, "A method of image-based aberration metrology for EUVL tools", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942215 (16 March 2015); doi: 10.1117/12.2087177; https://doi.org/10.1117/12.2087177


Back to Top