A method of image-based aberration metrology for EUVL tools

Zac Levinson; Sudharshanan Raghunathan; Erik Verduijn; Obert Wood; Pawitter Mangat; Kenneth Goldberg; Markus Benk; Antoine Wojdyla; Vicky Philipsen; Eric Hendrickx; Bruce W. Smith

doi:10.1117/12.2087177

16 March 2015 A method of image-based aberration metrology for EUVL tools

Zac Levinson, Sudharshanan Raghunathan, Erik Verduijn, Obert Wood, Pawitter Mangat, Kenneth Goldberg, Markus Benk, Antoine Wojdyla, Vicky Philipsen, Eric Hendrickx, Bruce W. Smith

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 942215 (2015) https://doi.org/10.1117/12.2087177
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

We present an approach to image-based EUV aberration metrology using binary mask targets and iterative model-based solutions to extract both the amplitude and phase components of the aberrated pupil function. The approach is enabled through previously developed modeling, fitting, and extraction algorithms. We examine the flexibility and criticality of the method using two experimental case studies. The first extracts the pupil phase behavior from an ASML NXE:3100 exposure system and shows primary aberration sensitivity below 0.2 mλ. The second experiment extracts both components of the pupil function from the SHARP EUV microscope.

Citation Download Citation

Zac Levinson, Zac Levinson, Sudharshanan Raghunathan, Sudharshanan Raghunathan, Erik Verduijn, Erik Verduijn, Obert Wood, Obert Wood, Pawitter Mangat, Pawitter Mangat, Kenneth Goldberg, Kenneth Goldberg, Markus Benk, Markus Benk, Antoine Wojdyla, Antoine Wojdyla, Vicky Philipsen, Vicky Philipsen, Eric Hendrickx, Eric Hendrickx, Bruce W. Smith, Bruce W. Smith, "A method of image-based aberration metrology for EUVL tools", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942215 (16 March 2015); doi: 10.1117/12.2087177; https://doi.org/10.1117/12.2087177

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