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16 March 2015 Actinic review of EUV masks: Status and recent results of the AIMS EUV system
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Abstract
The EUV mask infrastructure is of key importance for the successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. To realize such an actinic review tool, Carl Zeiss and the SEMATECH EUVL Mask Infrastructure consortium started a development program for an EUV aerial image metrology system, the AIMS™ EUV. In this paper, we discuss the current status of the prototype integration and show recent results.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Markus R. Weiss, Dirk Hellweg, Markus Koch, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, Krister Magnusson, Renzo Capelli, and Vibhu Jindal "Actinic review of EUV masks: Status and recent results of the AIMS EUV system", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942219 (16 March 2015); doi: 10.1117/12.2086265; https://doi.org/10.1117/12.2086265
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