6 April 2015 Application of differential phase contrast imaging to EUV mask inspection: a numerical study
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Abstract
We demonstrate numerically that oblique off-axis illumination could enhance the contrast and extend the depth of focus of EUV phase defects detection. In addition to quantitative observation, it also allows us to extract the resolution-limited defect phase profiles quantitatively. This scheme can be easily implemented in both full field and scanning mask inspection tools.
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Xibin Zhou, Xibin Zhou, Dominic Ashworth, Dominic Ashworth, Frank Goodwin, Frank Goodwin, Kevin Cummings, Kevin Cummings, } "Application of differential phase contrast imaging to EUV mask inspection: a numerical study", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221E (6 April 2015); doi: 10.1117/12.2085945; https://doi.org/10.1117/12.2085945
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