19 March 2015 Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
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Proceedings Volume 9423, Alternative Lithographic Technologies VII; 942306 (2015); doi: 10.1117/12.2085850
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States
Abstract
In this paper, we present an optimization methodology for the template designs of sub-resolution contacts using directed self-assembly (DSA) with grapho-epitaxy and immersion lithography. We demonstrate the flow using a 60nm-pitch contact design in doublet with Monte Carlo simulations for DSA. We introduce the notion of Template Error Enhancement Factor (TEEF) to gauge the sensitivity of DSA printing infidelity to template printing infidelity, and evaluate optimized template designs with TEEF metrics. Our data shows that SMO is critical to achieve sub-80nm non- L0 pitches for DSA patterns using 193i.
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Yuansheng Ma, Junjiang Lei, J. Andres Torres, Le Hong, James Word, Germain Fenger, Alexander Tritchkov, George Lippincott, Rachit Gupta, Neal Lafferty, Yuan He, Joost Bekaert, Geert Vanderberghe, "Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942306 (19 March 2015); doi: 10.1117/12.2085850; http://dx.doi.org/10.1117/12.2085850
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KEYWORDS
Directed self assembly

Photomasks

Optical proximity correction

Printing

Source mask optimization

Optical lithography

Neodymium

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