19 March 2015 Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
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In this paper, we present an optimization methodology for the template designs of sub-resolution contacts using directed self-assembly (DSA) with grapho-epitaxy and immersion lithography. We demonstrate the flow using a 60nm-pitch contact design in doublet with Monte Carlo simulations for DSA. We introduce the notion of Template Error Enhancement Factor (TEEF) to gauge the sensitivity of DSA printing infidelity to template printing infidelity, and evaluate optimized template designs with TEEF metrics. Our data shows that SMO is critical to achieve sub-80nm non- L0 pitches for DSA patterns using 193i.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuansheng Ma, Yuansheng Ma, Junjiang Lei, Junjiang Lei, J. Andres Torres, J. Andres Torres, Le Hong, Le Hong, James Word, James Word, Germain Fenger, Germain Fenger, Alexander Tritchkov, Alexander Tritchkov, George Lippincott, George Lippincott, Rachit Gupta, Rachit Gupta, Neal Lafferty, Neal Lafferty, Yuan He, Yuan He, Joost Bekaert, Joost Bekaert, Geert Vanderberghe, Geert Vanderberghe, } "Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942306 (19 March 2015); doi: 10.1117/12.2085850; https://doi.org/10.1117/12.2085850

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