19 March 2015 Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing
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Laser thermal annealing of PS-b-PMMA is shown to modify phase segregation within the milliseconds timeframe at temperatures from the glass transition to far above the order-disorder transition temperature. We report the kinetics of phase segregation of cylinder forming PS-b-PMMA (53.8 kg/mol, fPS = 0.7) as probed by micro-beam grazing incidence small angle X-ray scattering. Structure evolution was probed as a function of peak temperature, time at temperature, and quench rate, with phase segregation readily occurring on millisecond time scales and at peak quench rates up to 107 K/s. The final film morphology is dependent on both the anneal time and the quench rate to ambient. With heating to sufficiently high temperatures, the thermal history is erased yielding a final state is purely dependent on the quench rate.
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Alan G. Jacobs, Alan G. Jacobs, Clemens Liedel, Clemens Liedel, Christopher K. Ober, Christopher K. Ober, Michael O. Thompson, Michael O. Thompson, } "Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942309 (19 March 2015); doi: 10.1117/12.2086057; https://doi.org/10.1117/12.2086057

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