Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner; Cemal Aydogan; Hubert-Seweryn Lipowicz; Tzvetan Ivanov; Steve Lenk; Ahmad Ahmad; Tihomir Angelov; Alexander Reum; Valentyn Ishchuk; Ivaylo Atanasov; Yana Krivoshapkina; Manuel Hofer; Mathias Holz; Ivo W. Rangelow

doi:10.1117/12.2085846

17 March 2015 Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner, Cemal Aydogan, Hubert-Seweryn Lipowicz, Tzvetan Ivanov, Steve Lenk, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Ivaylo Atanasov, Yana Krivoshapkina, Manuel Hofer, Mathias Holz, Ivo W. Rangelow

Author Affiliations +

Proceedings Volume 9423, Alternative Lithographic Technologies VII; 94230E (2015) https://doi.org/10.1117/12.2085846
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The routine “on demand” fabrication of features smaller than 10 nm opens up new possibilities for the realization of many novel nanoelectronic, NEMS, optical and bio-nanotechnology-based devices. Based on the thermally actuated, piezoresistive cantilever technology we have developed a first prototype of a scanning probe lithography (SPL) platform able to image, inspect, align and pattern features down to single digit nano regime. The direct, mask-less patterning of molecular resists using active scanning probes represents a promising path circumventing the problems in today’s radiation-based lithography. Here, we present examples of practical applications of the previously published electric field based, current-controlled scanning probe lithography on molecular glass resist calixarene by using the developed tabletop SPL system. We demonstrate the application of a step-and-repeat scanning probe lithography scheme including optical as well as AFM based alignment and navigation. In addition, sequential read-write cycle patterning combining positive and negative tone lithography is shown. We are presenting patterning over larger areas (80 x 80 μm) and feature the practical applicability of the lithographic processes.

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Marcus Kaestner, Cemal Aydogan, Hubert-Seweryn Lipowicz, Tzvetan Ivanov, Steve Lenk, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Ivaylo Atanasov, Yana Krivoshapkina, Manuel Hofer, Mathias Holz, and Ivo W. Rangelow "Advanced electric-field scanning probe lithography on molecular resist using active cantilever", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230E (17 March 2015); https://doi.org/10.1117/12.2085846

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