17 March 2015 Advanced electric-field scanning probe lithography on molecular resist using active cantilever
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Abstract
The routine “on demand” fabrication of features smaller than 10 nm opens up new possibilities for the realization of many novel nanoelectronic, NEMS, optical and bio-nanotechnology-based devices. Based on the thermally actuated, piezoresistive cantilever technology we have developed a first prototype of a scanning probe lithography (SPL) platform able to image, inspect, align and pattern features down to single digit nano regime. The direct, mask-less patterning of molecular resists using active scanning probes represents a promising path circumventing the problems in today’s radiation-based lithography. Here, we present examples of practical applications of the previously published electric field based, current-controlled scanning probe lithography on molecular glass resist calixarene by using the developed tabletop SPL system. We demonstrate the application of a step-and-repeat scanning probe lithography scheme including optical as well as AFM based alignment and navigation. In addition, sequential read-write cycle patterning combining positive and negative tone lithography is shown. We are presenting patterning over larger areas (80 x 80 μm) and feature the practical applicability of the lithographic processes.
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Marcus Kaestner, Cemal Aydogan, Hubert-Seweryn Lipowicz, Tzvetan Ivanov, Steve Lenk, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Ivaylo Atanasov, Yana Krivoshapkina, Manuel Hofer, Mathias Holz, Ivo W. Rangelow, "Advanced electric-field scanning probe lithography on molecular resist using active cantilever", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230E (17 March 2015); doi: 10.1117/12.2085846; https://doi.org/10.1117/12.2085846
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