17 March 2015 Advanced electric-field scanning probe lithography on molecular resist using active cantilever
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The routine “on demand” fabrication of features smaller than 10 nm opens up new possibilities for the realization of many novel nanoelectronic, NEMS, optical and bio-nanotechnology-based devices. Based on the thermally actuated, piezoresistive cantilever technology we have developed a first prototype of a scanning probe lithography (SPL) platform able to image, inspect, align and pattern features down to single digit nano regime. The direct, mask-less patterning of molecular resists using active scanning probes represents a promising path circumventing the problems in today’s radiation-based lithography. Here, we present examples of practical applications of the previously published electric field based, current-controlled scanning probe lithography on molecular glass resist calixarene by using the developed tabletop SPL system. We demonstrate the application of a step-and-repeat scanning probe lithography scheme including optical as well as AFM based alignment and navigation. In addition, sequential read-write cycle patterning combining positive and negative tone lithography is shown. We are presenting patterning over larger areas (80 x 80 μm) and feature the practical applicability of the lithographic processes.
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Marcus Kaestner, Marcus Kaestner, Cemal Aydogan, Cemal Aydogan, Hubert-Seweryn Lipowicz, Hubert-Seweryn Lipowicz, Tzvetan Ivanov, Tzvetan Ivanov, Steve Lenk, Steve Lenk, Ahmad Ahmad, Ahmad Ahmad, Tihomir Angelov, Tihomir Angelov, Alexander Reum, Alexander Reum, Valentyn Ishchuk, Valentyn Ishchuk, Ivaylo Atanasov, Ivaylo Atanasov, Yana Krivoshapkina, Yana Krivoshapkina, Manuel Hofer, Manuel Hofer, Mathias Holz, Mathias Holz, Ivo W. Rangelow, Ivo W. Rangelow, "Advanced electric-field scanning probe lithography on molecular resist using active cantilever", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230E (17 March 2015); doi: 10.1117/12.2085846; https://doi.org/10.1117/12.2085846

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