19 March 2015 Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow
Author Affiliations +
High defect density in thermodynamics driven DSA flows has been a major cause of concern for a while and several questions have been raised about the relevance of DSA in high volume manufacturing. The major questions raised in this regard are: 1. What is the intrinsic level of DSA-induced defects, 2. Can we isolate the DSA-induced defects from the other processes-induced defects, 3. How much do the DSA materials contribute to the final defectivity and can this be controlled, 4. How can we understand the root causes of the DSA-induced defects, their kinetics of annihilation and finally, 5. Can we have block co-polymer anneal durations that are compatible with standard CMOS fabrication techniques (in the range of minutes) with low defect levels. This manuscript addresses these important questions and identifies the issues and the level of control needed to achieve a stable DSA defect performance.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hari Pathangi, Hari Pathangi, Boon Teik Chan, Boon Teik Chan, Hareen Bayana, Hareen Bayana, Nadia Vandenbroeck, Nadia Vandenbroeck, Dieter Van Den Heuvel, Dieter Van Den Heuvel, Lieve Van Look, Lieve Van Look, Paulina Rincon-Delgadillo, Paulina Rincon-Delgadillo, Yi Cao, Yi Cao, JiHoon Kim, JiHoon Kim, Guanyang Lin, Guanyang Lin, Doni Parnell, Doni Parnell, Kathleen Nafus, Kathleen Nafus, Ryota Harukawa, Ryota Harukawa, Ito Chikashi, Ito Chikashi, Venkat Nagaswami, Venkat Nagaswami, Lucia D'Urzo, Lucia D'Urzo, Roel Gronheid, Roel Gronheid, Paul Nealey, Paul Nealey, "Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230M (19 March 2015); doi: 10.1117/12.2085889; https://doi.org/10.1117/12.2085889

Back to Top