19 March 2015 Fabrication of NIL templates and diffractive optical elements using the new Vistec SB4050 VSB e-beam writer
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Abstract
Targeting mass production of nanostructures, nanoimprint lithography (NIL) is one of the most cost-effective ways to do so. One of the most critical topics is the pattern quality of the imprint master template. Therefore the new Vistec SB4050 VSB e-beam writer has been evaluated regarding its capability for state-of-the-art NIL template and DOE making. Equipped with a new air bearing stage the tool can expose a wide variety of substrates including large and heavy ones. For 9035 substrates a placement accuracy of 9nm (3sigma) as well as an overlay accuracy of 7nm (3sigma) with a mean error below 2nm has been achieved. Targeting for minimum feature size, a resolution below 30nm has been achieved for both, dense lines and holes pattern even using CAR. In addition, 3D structuring capability has been proved by applying GenISys’ Layout Beamer calibrated for an appropriate negative tone resist. Further investigation has been done on shot count optimization regarding circular holes respective pillars. Using a feature size dependent segmentation, writing time reduction could be achieved keeping the original feature shape. Besides screening of typical tool parameter an application driven evaluation has been done by fabricating different type of templates based on silicon and quartz. 2D and 3D features have been realized. Furthermore holograms have been fabricated and proved for their performance by optical measurements.
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Joerg Butschke, Mathias Irmscher, Corinna Koepernik, Stephan Martens, Holger Sailer, Bernd Schnabel, "Fabrication of NIL templates and diffractive optical elements using the new Vistec SB4050 VSB e-beam writer", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94231A (19 March 2015); doi: 10.1117/12.2086610; https://doi.org/10.1117/12.2086610
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