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19 March 2015 Tilting of lamellar domains on neutral random copolymer brushes
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Thin films of lamellar poly(styrene-b-methyl methacrylate) (PS-PMMA) block copolymers were prepared on brushed silicon substrates with a range of thicknesses. The brushes are expected to eliminate preferential interactions at the substrate, thereby enabling perpendicular domain orientations relative to the interfaces. Using a combination of surface microscopy and grazing incidence small-angle X-ray scattering, we demonstrate that i) the brushed substrates are weakly preferential to PMMA; and ii) the average lamellar domain orientation is perpendicular to the substrate, but some domains are mis-oriented by up to 40º. We propose that PMMA domains deform to increase their contact area at the slightly preferential substrate, and this behavior drives the formation of out-of-plane defects such as bent or tilted domains. These outcomes suggest that depth-resolved measurements are needed to fully optimize materials and processes for block copolymer lithography.
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Indranil Mitra, Nikhila Mahadevapuram, Joseph Strzalka, and Gila E. Stein "Tilting of lamellar domains on neutral random copolymer brushes", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942320 (19 March 2015);

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