27 March 2015 193i lithography for contact doubling with grapho-epitaxy DSA: a simulation study
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Abstract
Directed self-assembly (DSA) of block copolymers (BCP) is a promising candidate for alternative micro lithography due to its cost effectiveness, its ability to reduce critical dimension and to increase pattern density. For contact layer patterning, grapho-epitaxy combined with cylindrical BCP is a good candidate. While contact shrink has already been a well-controlled process, contact multiplication is still undergoing further studies. In this paper we propose to study the impact of 193i scanner variations on BCP overlay for contact doubling.
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A. Fouquet, A. Fouquet, L. Perraud, L. Perraud, S. Bérard-Bergery, S. Bérard-Bergery, A. Gharbi, A. Gharbi, P. Pimenta-Barros, P. Pimenta-Barros, R. Tiron, R. Tiron, J. Hazart, J. Hazart, V. Farys, V. Farys, } "193i lithography for contact doubling with grapho-epitaxy DSA: a simulation study", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942324 (27 March 2015); doi: 10.1117/12.2085822; https://doi.org/10.1117/12.2085822
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