27 March 2015 Study of DSA interaction range using Gaussian convolution
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Abstract
Directed Self-Assembly (DSA) of block copolymers (BCP) has attracted increasing attention as the potential next generation lithography technology. One of the most promising applications of DSA is the patterning of contact holes in IC circuits using physical guiding templates. In previous studies, researchers have demonstrated that DSA patterns are determined not only by the size and shape of guiding templates, but the template density as well. However, the influence of the pattern density has not been explored systematically, nor is there a fast inspection methodology to visualize and quantify the influence. In this paper, we introduce the concept of DSA Interaction Range (DSAIR). The influence of template density on the DSA patterns is examined using Gaussian convolution of x with y [say what it is a convolution of]. This approach provides us with a fast and quantitative way to model the influence of template density and predict the location of overfilled conditions.
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He Yi, Joost Bekaert, Roel Gronheid, Germain Fenger, Kathleen Nafus, H.-S. Philip Wong, "Study of DSA interaction range using Gaussian convolution", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94232A (27 March 2015); doi: 10.1117/12.2085985; https://doi.org/10.1117/12.2085985
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