19 March 2015 Further advancing the throughput of a multi-beam SEM
Author Affiliations +
Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 94241U (2015); doi: 10.1117/12.2188560
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States
Abstract
Multiple electron beam SEMs enable detecting structures of few nanometer in diameter at much higher throughputs than possible with single beam electron microscopes at comparable electron probe parameters. Although recent multiple beam SEM development has already demonstrated a large speed increase1, higher throughputs are still required to match the needs of many semiconductor applications2. We demonstrate the next step in the development of multi-beam SEMs by increasing the number of beams and the current per beam. The modularity of the multi-beam concept ensures that design changes in the multi-beam SEM are minimized.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas Kemen, Matt Malloy, Brad Thiel, Shawn Mikula, Winfried Denk, Gregor Dellemann, Dirk Zeidler, "Further advancing the throughput of a multi-beam SEM", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241U (19 March 2015); doi: 10.1117/12.2188560; http://dx.doi.org/10.1117/12.2188560
PROCEEDINGS
6 PAGES


SHARE
KEYWORDS
Scanning electron microscopy

Sensors

Electron beams

Signal to noise ratio

Image resolution

Beam splitters

Brain

Back to Top