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Thomas Kemen, Matt Malloy, Brad Thiel, Shawn Mikula, Winfried Denk, Gregor Dellemann, Dirk Zeidler, "Further advancing the throughput of a multi-beam SEM," Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241U (19 March 2015);