Application of frequency domain line edge roughness characterization methodology in lithography

Lei Sun; Wenhui Wang; Genevieve Beique; Obert Wood II; Ryoung-Han Kim

doi:10.1117/12.2086961

19 March 2015 Application of frequency domain line edge roughness characterization methodology in lithography

Lei Sun, Wenhui Wang, Genevieve Beique, Obert Wood II, Ryoung-Han Kim

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 942404 (2015) https://doi.org/10.1117/12.2086961
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

A frequency domain 3 sigma LER characterization methodology combining the standard deviation and power spectral density (PSD) methods is proposed. In the new method, the standard deviation is calculated in the frequency domain instead of the spatial domain as in the conventional method. The power spectrum of the LER is divided into three regions: low frequency (LF), middle frequency (MF) and high frequency (HF) regions. The frequency region definition is based on process visual comparisons. Three standard deviation numbers are used to characterize the LER in the three frequency regions. Pattern wiggling can be detected quantitatively with a wiggling factor which is also proposed in this paper.

Citation Download Citation

Lei Sun, Wenhui Wang, Genevieve Beique, Obert Wood II, and Ryoung-Han Kim "Application of frequency domain line edge roughness characterization methodology in lithography", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942404 (19 March 2015); https://doi.org/10.1117/12.2086961

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