19 March 2015 Scatterometric analysis of a plasmonic test structure
Author Affiliations +
Abstract
Traditional ellipsometric measurements of copper gratings are limited to Angstrom resolution and are rather insensitive to changes in the critical dimension (CD) or pitch of the structure. By adding another grating per- pendicular and with larger CD and pitch, sensitivity is greatly enhanced. The spectra of one dimensional grat- ings is largely featureless over a wide range of CDs while crossed-gratings exhibit large minima which shift with changing CDs of less than an Angstrom. This improvement is due to plasmonic activity in the crossed-grating, demonstrated in detail here. Mueller matrix element analysis under azimuthal rotation provides information about cross-polarization and plasmon coupling conditions.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Samuel O'Mullane, Nick Keller, Joseph Race, Brian Martinick, Alain Diebold, "Scatterometric analysis of a plasmonic test structure", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942411 (19 March 2015); doi: 10.1117/12.2085933; https://doi.org/10.1117/12.2085933
PROCEEDINGS
7 PAGES


SHARE
Back to Top