19 March 2015 Hybrid metrology implementation: server approach
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Hybrid metrology (HM) is the practice of combining measurements from multiple toolset types in order to enable or improve metrology for advanced structures. HM is implemented in two phases: Phase-1 includes readiness of the infrastructure to transfer processed data from the first toolset to the second. Phase-2 infrastructure allows simultaneous transfer and optimization of raw data between toolsets such as spectra, images, traces – co-optimization. We discuss the extension of Phase-1 to include direct high-bandwidth communication between toolsets using a hybrid server, enabling seamless fab deployment and further laying the groundwork for Phase-2 high volume manufacturing (HVM) implementation. An example of the communication protocol shows the information that can be used by the hybrid server, differentiating its capabilities from that of a host-based approach. We demonstrate qualification and production implementation of the hybrid server approach using CD-SEM and OCD toolsets for complex 20nm and 14nm applications. Finally we discuss the roadmap for Phase-2 HM implementation through use of the hybrid server.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Carmen Osorio, Carmen Osorio, Padraig Timoney, Padraig Timoney, Alok Vaid, Alok Vaid, Alex Elia, Alex Elia, Charles Kang, Charles Kang, Cornel Bozdog, Cornel Bozdog, Naren Yellai, Naren Yellai, Eyal Grubner, Eyal Grubner, Toru Ikegami, Toru Ikegami, Masahiko Ikeno, Masahiko Ikeno, "Hybrid metrology implementation: server approach", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241H (19 March 2015); doi: 10.1117/12.2087233; https://doi.org/10.1117/12.2087233

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