19 March 2015 Overlay measurement accuracy enhancement by design and algorithm
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Advanced design nodes require more complex lithography techniques, such as double patterning, as well as advanced materials like hard masks. This poses new challenge for overlay metrology and process control. In this publication several step are taken to face these challenges. Accurate overlay metrology solutions are demonstrated for advanced memory devices.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Honggoo Lee, Byongseog Lee, Sangjun Han, Myoungsoo Kim, Wontaik Kwon, Sungki Park, DongSub Choi, Dohwa Lee, Sanghuck Jeon, Kangsan Lee, Tal Itzkovich, Nuriel Amir, Roie Volkovich, Eitan Herzel, Mark Wagner, Mohamed El Kodadi, "Overlay measurement accuracy enhancement by design and algorithm", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242B (19 March 2015); doi: 10.1117/12.2085272; https://doi.org/10.1117/12.2085272


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