Real time decision based multiple mode SEM review imaging solution

Huina Xu; Harsh Sinha; Garry Chen; White Pai; Jung Yan Yang; Charles Tsai

doi:10.1117/12.2086505

19 March 2015 Real time decision based multiple mode SEM review imaging solution

Huina Xu; Harsh Sinha; Garry Chen; White Pai; Jung Yan Yang; Charles Tsai

Author Affiliations +

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 94242G (2015) https://doi.org/10.1117/12.2086505
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Embedded defect types continue to be a challenge for scanning electron microscopes (SEM) review solutions. Though high energy beams can be used to image these defect types, they cause damage to the reviewed sites. Also, imaging all review sites at higher electron energy has often resulted in low topography surface defects to be non-visible due to high penetration depth. In this work we present a method in which defects are reviewed at non-destructive lower electron energies and only the non-visual review sites are reviewed at higher electron energies to image any potential additional defect types. The non-visual defects are identified inline during review using automatic defect classification attributes.

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Huina Xu, Huina Xu, Harsh Sinha, Harsh Sinha, Garry Chen, Garry Chen, White Pai, White Pai, Jung Yan Yang, Jung Yan Yang, Charles Tsai, Charles Tsai, } "Real time decision based multiple mode SEM review imaging solution", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242G (19 March 2015); doi: 10.1117/12.2086505; https://doi.org/10.1117/12.2086505

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