19 March 2015 Carbon dioxide gas purification and analytical measurement for leading edge 193nm lithography
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Abstract
The use of purified carbon dioxide (CO2) has become a reality for leading edge 193 nm immersion lithography scanners. Traditionally, both dry and immersion 193 nm lithographic processes have constantly purged the optics stack with ultrahigh purity compressed dry air (UHPCDA). CO2 has been utilized for a similar purpose as UHPCDA. Airborne molecular contamniation (AMC) purification technologies and analytical measurement methods have been extensively developed to support the Lithography Tool Manufacturers purity requirements. This paper covers the analytical tests and characterizations carried out to assess impurity removal from 3.0 N CO2 (beverage grade) for its final utilization in 193 nm and EUV scanners.
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Sarah Riddle Vogt, Sarah Riddle Vogt, Cristian Landoni, Cristian Landoni, Chuck Applegarth, Chuck Applegarth, Matt Browning, Matt Browning, Marco Succi, Marco Succi, Simona Pirola, Simona Pirola, Giorgio Macchi, Giorgio Macchi, } "Carbon dioxide gas purification and analytical measurement for leading edge 193nm lithography", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242N (19 March 2015); doi: 10.1117/12.2085963; https://doi.org/10.1117/12.2085963
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