20 March 2015 Analysis of the self-assembling and the defect annihilation processes in DSA using meso-scale simulation
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Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 942510 (2015); doi: 10.1117/12.2085650
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States
Abstract
Recently, directed self-assembly (DSA) method is focused on as a next generation lithography technique. We performed the DPD simulations to analyze the self-assembling process of block copolymer in DSA using OCTA (in detail, see http://octa.jp) system. Using DPD simulation, we can obtain the phase separated structures at each moment consisted by block copolymer chains. As those structures are consisted by polymer chains, an analysis can be done on those structures. In this paper, we study the dynamics of end particles in the defect annihilation process to understand the dynamics of self-assembling of block copolymer in DSA. From our analysis, the end particles moves in advance than the change of domain structure in the defect annihilation process.
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Hiroshi Morita, Yuki Norizoe, "Analysis of the self-assembling and the defect annihilation processes in DSA using meso-scale simulation", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942510 (20 March 2015); doi: 10.1117/12.2085650; http://dx.doi.org/10.1117/12.2085650
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KEYWORDS
Particles

Monte Carlo methods

Polymers

Directed self assembly

Lithography

Optical lithography

Analytical research

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