20 March 2015 Recent progress of negative-tone imaging with EUV exposure
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This study describes the recent progress of negative-tone imaging with EUV exposure (EUV-NTI) compared with positive-tone development (PTD). NTI uses organic solvent-based developer to provide low swelling and smooth-dissolving behavior. Therefore, EUV-NTI is expected to offer several advantages in terms of performance, especially for improving line-width roughness (LWR), which is expected to resolve the resolution, LWR, and sensitivity (RLS) tradeoff. Herein, novel chemical amplified resist materials for EUV-NTI are investigated to improve LWR and sensitivity. Results indicate that the EUV-NTI has better performance than PTD, with ‘single digit mJ/cm2,while maintaining the LWR performance. Furthermore, EUV-NTI processing such as the pre-applied bake (PAB) temperature, post-exposure bake (PEB) temperature, development procedure, and rinse procedure are very effective for improving the lithographic performance. In addition, the lithographic performance with NXE3100 scanner is also reported.
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Toru Fujimori, Toru Fujimori, Toru Tsuchihashi, Toru Tsuchihashi, Toshiro Itani, Toshiro Itani, "Recent progress of negative-tone imaging with EUV exposure", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942505 (20 March 2015); doi: 10.1117/12.2085706; https://doi.org/10.1117/12.2085706

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