20 March 2015 High-sensitivity molecular organometallic resist for EUV (MORE)
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We have developed organometallic carboxylate compounds [RnM(O2CR’)2] capable of acting as negativetone EUV resists. Overall, the best and fastest resists contain antimony, are pentavalent and the carboxylate group contains a polymerizable olefin (e.g. acrylate, methacrylate or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of molecules of the type RnM(O2CR’)2 where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O2CR’). We found that the greatest predictor of sensitivity of the RnSb(O2CR’)2 resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins vs. the number of non-hydrogen atoms. Linear and log plots of Emax vs. POL for a variety of molecules of the type R3Sb(O2CR’)2 lend insight into the behaviour of these resists.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James Passarelli, James Passarelli, Michael Murphy, Michael Murphy, Ryan Del Re, Ryan Del Re, Miriam Sortland, Miriam Sortland, Levi Dousharm, Levi Dousharm, Michaela Vockenhuber, Michaela Vockenhuber, Yasin Ekinci, Yasin Ekinci, Mark Neisser, Mark Neisser, Daniel A. Freedman, Daniel A. Freedman, Robert L. Brainard, Robert L. Brainard, "High-sensitivity molecular organometallic resist for EUV (MORE)", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94250T (20 March 2015); doi: 10.1117/12.2086599; https://doi.org/10.1117/12.2086599

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