20 March 2015 Studying the mechanism of hybrid nanoparticle EUV photoresists
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Abstract
This work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential.
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Ben Zhang, Ben Zhang, Li Li, Li Li, Jing Jiang, Jing Jiang, Mark Neisser, Mark Neisser, Jun Sung Chun, Jun Sung Chun, Christopher K. Ober, Christopher K. Ober, Emmanuel P. Giannelis, Emmanuel P. Giannelis, } "Studying the mechanism of hybrid nanoparticle EUV photoresists", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251E (20 March 2015); doi: 10.1117/12.2085662; https://doi.org/10.1117/12.2085662
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