20 March 2015 Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL
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Abstract
In this paper, we report the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. The new xanthendiol derivatives were easily synthesized by the condensation of aldehydes and dihydroxyaromatic compounds. We found 13,13’-biphenyl-bis(13H-benzoxanthen-2,11-diol) was showed the good applicability to the raw material for the resist for EB/EUVL. The EB patterning result showed the resist containing xanthendiol derivative could resolve the 20 nm half-pitch pattern, and 15 nm half-pitch patterns were partially resolved.
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Takumi Toida, Takumi Toida, Akihiro Suzuki, Akihiro Suzuki, Naoya Uchiyama, Naoya Uchiyama, Takashi Makinoshima, Takashi Makinoshima, Masaaki Takasuka, Masaaki Takasuka, Takashi Sato, Takashi Sato, Masatoshi Echigo, Masatoshi Echigo, "Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251L (20 March 2015); doi: 10.1117/12.2085470; https://doi.org/10.1117/12.2085470
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