CONFERENCE PROCEEDINGS
Advanced Search >
Home > Proceedings > Volume 9425 > Article
20 March 2015 Development of spin-on metal hardmask (SOMHM) for advanced node
Shintaro Yamada, Deyan Wang, Vivian Chuang, Cong Liu, Sabrina Wong, Michael B Clark, Charlotte Cutler, William Williams, Paul Baranowski, Mingqi Li, Joe Mattia, JoAnne Leonard, Peter Trefonas, Kathleen O’Connell, Cheng bai Xu
Author Affiliations +
Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 94251X (2015) https://doi.org/10.1117/12.2086005
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States
Abstract
With the continuous demand for higher performance of computer chips and memories, device patterns and structures are becoming smaller and more complicated. Hard mask processes have been implemented in various steps in the devise manufacturing, and requirements for those materials are versatile. In this paper, novel organometal materials are presented as a new class of spin on solution in order to support the hard mask process. Type of metals, formulation scheme and processing conditions were carefully designed to meet the fundamental requirements as a spin on solution, and their characteristic properties were investigated in comparison to other conventional films such as spin on carbons (SOC), organic bottom anti-reflective coatings (oBARC) and inorganic films formed by chemical vapor deposition (CVD). Several advantages were identified with these SOMHM materials over other films which include 1) better thermal stability than SOC once fully cured, 2) reworkable with industry standard wet chemistry such as SC-1 where conventional Si-BARC is difficult to remove, 3) a wide range of optical constants to suppress reflection for photoresist imaging, 4) high etch resistance and 5) better gap filling property. Curing conditions showed a significant impact on the performance of SOMHM films, and X-ray photoelectron spectroscopy (XPS) was utilized to elucidate the trends. With SOMHM film as a BARC, photolithographic imaging was demonstrated under ArF immersion conditions with 40nm linewidth patterning.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Shintaro Yamada, Shintaro Yamada, Deyan Wang, Deyan Wang, Vivian Chuang, Vivian Chuang, Cong Liu, Cong Liu, Sabrina Wong, Sabrina Wong, Michael B Clark, Michael B Clark, Charlotte Cutler, Charlotte Cutler, William Williams, William Williams, Paul Baranowski, Paul Baranowski, Mingqi Li, Mingqi Li, Joe Mattia, Joe Mattia, JoAnne Leonard, JoAnne Leonard, Peter Trefonas, Peter Trefonas, Kathleen O’Connell, Kathleen O’Connell, Cheng bai Xu, Cheng bai Xu, "Development of spin-on metal hardmask (SOMHM) for advanced node", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251X (20 March 2015); doi: 10.1117/12.2086005; https://doi.org/10.1117/12.2086005
ACCESS THE FULL ARTICLE
PERSONAL SIGN IN
Full access may be available with your subscription
 
Forgot your username?
Forgot your password?
No SPIE account? Create an account
or Institutional Sign In via Shibboleth
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $14.40
Non-members: $18.00 ADD TO CART
PROCEEDINGS
 11 PAGES
DOWNLOAD PDF + SAVE TO MY LIBRARY
SHARE
GET CITATION
< Previous Article
|
Next Article >
KEYWORDS
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top