Microbridge reduction in negative-tone imaging at photoresist point-of-use filtration

Toru Umeda; Tsukasa Yamanaka; Naoya Iguchi; Shuichi Tsuzuki

doi:10.1117/12.2085710

20 March 2015 Microbridge reduction in negative-tone imaging at photoresist point-of-use filtration

Toru Umeda, Tsukasa Yamanaka, Naoya Iguchi, Shuichi Tsuzuki

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 942521 (2015) https://doi.org/10.1117/12.2085710
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

It is well known that point-of-use (POU) filtration is an effective means of reducing microbridging defects in lithographic processes involving photoresists. To date, most of the optimization studies have been targeted toward understanding the microbridging defects in positive tone imaging (PTI) process. Considering that negative tone imaging (NTI) process has recently been introduced in advanced technology nodes, we focused our POU filtration studies on understanding the factors that modulate microbridging in NTI and PTI processes. Our studies pointed out that Nylon 6,6 membrane is distinctly more effective in reducing microbridging defects in NTI resists, whereas HDPE membranes show significant improvement in PTI resists. These results were rationalized based on the polarity differences of microbridges in PTI and NTI processes.

Citation Download Citation

Toru Umeda, Tsukasa Yamanaka, Naoya Iguchi, and Shuichi Tsuzuki "Microbridge reduction in negative-tone imaging at photoresist point-of-use filtration", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942521 (20 March 2015); https://doi.org/10.1117/12.2085710

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