20 March 2015 Novel thin film analysis to investigate actual film formation
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Abstract
In order to understand the mechanism of the pattern wiggling distortion and to find control knobs for improving wiggle performance of spin-on carbon hard mask materials, we have developed analysis method of underlayer (UL) films by utilizing XPS depth profiling using Gas Cluster Ion Beam(GCIB-XPS). Differences of distributions of elemental compositions from the surface to the bottom of the processed or un-processed films have been visualized by GCIB-XPS analysis. Besides, these achievements allow us to identify fluoro substitution of oxygen during etching process as the control knob for the pattern wiggling distortion.
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Kazunori Sakai, Kazunori Sakai, Kenji Mochida, Kenji Mochida, Shinichi Nakamura, Shinichi Nakamura, Tooru Kimura, Tooru Kimura, Kazuhiro Yoshikawa, Kazuhiro Yoshikawa, Naoki Man, Naoki Man, Hirofumi Seiki, Hirofumi Seiki, Masaaki Takeda, Masaaki Takeda, } "Novel thin film analysis to investigate actual film formation", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942522 (20 March 2015); doi: 10.1117/12.2085717; https://doi.org/10.1117/12.2085717
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