24 April 2015 Front Matter: Volume 9426
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 9426, including the Title Page, Copyright information, Table of Contents, Authors, Introduction (if any), and Conference Committee listing.

The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

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Author(s), "Title of Paper," in Optical Microlithography XXVIII, edited by Kafai Lai, Andreas Erdmann, Proceedings of SPIE Vol. 9426 (SPIE, Bellingham, WA, 2015) Article CID Number.

ISSN: 0277-786X

ISBN: 9781628415285

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Paper Numbering: Proceedings of SPIE follow an e-First publication model, with papers published first online and then in print. Papers are published as they are submitted and meet publication criteria. A unique citation identifier (CID) number is assigned to each article at the time of the first publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online, print, and electronic versions of the publication. SPIE uses a six-digit CID article numbering system in which:

  • The first four digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc.

The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages.

Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc.

Abdo, Amr, 0W

Ackmann, Paul, 0T

Adam, Kostas, 0P

Affentauschegg, Cedric, 08

Aggarwal, Tanuj, 18, 24

Alagna, Paolo, 07, 09, 1D

Allouti, Nacima, 0D

An, Yongbae, 1X

Aoyama, Hajime, 21

Apostol, Ştefan, 0K, 1K, 1Z

Axelrad, Valery, 1U

Babcock, Carl P., 11

Bachmann, Michael, 06

Bailey, Todd, 0Y

Barnola, Sébastien, 0D

Barouch, Eytan, 0R

Baselmans, Jan, 08, 09

Batarseh, Fadi, 11

Baudot, Charles, 0D

Bérard-Bergery, Sébastien, 0D

Bibby, T., 18

Bornebroek, Frank, 16

Botter, Herman, 16

Bourgin, Yannick, 0E

Bramati, Arianna, 1M

Brision, Stéphane, 0D

Brunner, Timothy, 13

Cacouris, T., 18

Casati, Nathalie, 0W

Chang, C. S., 1F

Chen, Ao, 1P

Chen, K. C., 1F

Chen, Quan, 21

Chen, Xuanbo, 1G

Choi, Jaeseung, 1X

Choi, Young-Sin, 08, 12

Chu, W. H., 1S

Chunder, Anindarupa, 0J

Chung, Angeline, 1P

Ciofi, Ivan, 06

Clifford, Chris, 0P

Comboroure, Corinne, 0D

Conley, Will, 07, 18, 25

Connolly, Brid, 0O

Coskun, Tamer H., 0V

Croffie, Ebo, 0Q

Dao, Hoang, 25

de Boeij, Wim P., 16

de Graaf, Roelof F., 16

de Kort, Toine, 16

Demmerle, Wolfgang, 06

Deng, Yunfei, 1P, 1R

Do, Munhoe, 1X

Dong, Lisong, 1G

Dong, LiSong, 1H

Droste, Richard, 16

Du, Yaojun, 1V, 1W

Dunlap, David, 25

Enami, Tatsuo, 27, 28

Erdmann, Andreas, 0H

Evanschitzky, Peter, 0H

Feng, Jiayun, 23

Ferrotti, Thomas, 0D

Finders, Jo, 05

Flagello, Donis G., 04

Flores, Ronnie, 25

Foong, Yee Mei, 1P, 1Y

Fourkas, John T., 0C

Fryer, David, 0P, 1P

Fujii, Koichi, 1O

Fukuda, Hitomi, 28

Funatsu, Takayuki, 17

Gabrani, Maria, 0W

Galvier, Jean, 05

Gao, Jie, 1G

Gao, Weimin, 06

Gavrilin, Dmitrii, 0S

Gays, Fabien, 0D

Geh, Bernd, 08

Ghaida, Rani S., 11

Gillespie, Walter, 26

Gillijns, Werner, 06

Granik, Yuri, 1P, 1R

Gräupner, Paul, 0H

Graur, Ioana, 0Y

Greiner, Andreas, 0S

Gross, Eric, 18, 26

Guo, Moran, 1H

Ha, Hun Hwan, 08, 12

Halle, Scott, 0Y

Haran, Don, 26

Hayakawa, Akira, 17

He, Xin, 23

He, Yuan, 0L

Herzig, Hans Peter, 0I

Hikida, Yujiro, 17

Hirai, Yoshikazu, 0F

Hirayama, Toru, 17

Hitomi, Keiichiro, 0Y

Hofmann, Detlef, 0S

Hou, Yaching, 07

Hsieh, Simon, 07

Huang, C. H., 1F

Huang, S. Y., 1S

Hurley, Paul, 0K, 1K, 1Z

Hwang, Hyun Woo, 14

Imai, Motokatsu, 1O

Ionescu, Radu-Cristian, 0K, 1Z

Ishida, Keisuke, 1A, 1J

Ishii, Hiroyuki, 1U

Ishiyama, Satoshi, 17

Jaiswal, Om, 0W

Janda, Eric, 08

Jantzen, Kenneth, 1T

Jing, Nan, 13

Kakizaki, Kouji, 1A, 1J

Kamohara, Itaru, 0S

Kanaya, Reiji, 1O

Kang, Young-Seog, 08, 12, 14

Käsebier, Thomas, 0E

Kato, Yoshiki, 0F

Kim, Sunny Jang-Sun, 08, 12

Kim, Ryoung-Han, 0J

Kim, Seongjin, 1X

Kim, Young Ha, 08

Kim, Young Hoon, 12

Kimura, Taiki, 10

Kley, Ernst-Bernhard, 0E

Klostermann, Ulrich, 0S

Koh, Kar Kit, 1Y

Kong, Jeong Heung, 12, 14

Kono, Hirotaka, 17, 19

Kopp, Christophe, 0D

Kotani, Toshiya, 10

Kumazaki, Takahito, 1A, 1J

Kuo, C. C., 1S

Kuo, Hung-Fei, 0M

Kurosu, Akihiko, 1A, 1J

Kwon, Oh-Sung, 08

Kye, Jongwook, 0J, 0T

Lafferty, Neal, 0L

Lake, Matt, 25, 26

Lam, Michael, 0P

Lange, Falk, 0O

Lee, Byeong Soo, 14

Li, Frederick, 0M

Li, Sikun, 1E, 1L

Li, Xiaoping, 23

Li, Yanqiu, 1G

Lin, Burn J., 02

Lin, H. T., 1S

Lin, Qun Ying 1O

Liu, QingWei, 0L

Liu, Yansong, 1H

Luan, Lan, 1Q

Lucas, Kevin, 06

Lutich, Andrey, 0U

Ma, Xiaoxu, 0F

Ma, Xu, 1G

Madhavan, Sriram, 11

Mailfert, Julien, 09

Mariolle, Denis, 0D

Martinez, Pedro, 07

Masaki, Kazuo, 19

Mason, Eric, 26

Matagne, Philippe, 06

Matsunaga, Takashi, 1A, 1J

Matsunawa, Tetsuaki, 0X

Matsuyama, Tomoyuki, 19, 1O, 21

McGowan, Sarah, 11

McLaren, Matthew G., 16

Medvedev, Dmitry, 1P

Mehta, Sohan, 0T

Melchior, J., 18

Menezo, Sylvie, 0D

Mikami, Koji, 1U

Miller, Marshal, 0Y

Minegishi, Yuji, 27, 28

Miyazawa, Tami, 21

Mizoguchi, Hakaru, 1A, 1J

Moeller, Holger, 0S

Morgana, Nicoló, 0S

Morgenfeld, Bradley, 13

Nakashima, Toshiharu, 1C

Nakayama, Ryo, 1U

Nam, Young-Sun, 08, 12

Neumann, Jens Timo, 0H

Neureuther, Andy, 0O

Oberschmidt, James, 0W

O’Brien, Kevin, 24, 25

Ochiai, Hideyuki, 27

Ohta, Takeshi, 1A, 1J, 27

Oliver, Mike, 0P

Omran, A., 1T

Oulmane, Mohamed, 06

Oyama, Kenichi, 1U

Padmabandu, G. G., 26

Pan, David Z., 0X

Park, Seemoon, 19

Pathak, Piyush, 11

Pei, Jinhua, 0L

Pike, Michael, 13

Ping, Yang Y., 11

Pistor, Thomas V., 0T

Ponomarenko, Mariya, 08

Preuninger, Juergen, 0S

Puthankovilakam, Krishnaparvathy, 0I

Rechtsteiner, Greg, 09, 1D

Renwick, Stephen P., 04

Rizvi, Umar, 08

Saad, Yves, 06

Scharf, Toralf, 0I

Schmoeller, Thomas, 06

Sczyrba, Martin, 0O

Sei, Toshihiko, 21

Shanker, Aamod, 0O

Shao, Chun, 21

Shao, Feng, 0L

Shen, Lina, 1E

Shi, Xuelong, 0L

Shibazaki, Yuichi, 17, 19

Shibuya, Masato, 1C

Shin, Ju Hee, 08, 12

Shin, Si Woo, 12

Shirata, Yosuke, 17

Siefke, Thomas, 0E

Simic, Aleks, 25

Slotboom, Daan, 08

Smayling, Michael C., 1U

Somani, Shikha, 11

Song, Hua, 0N, 1Q

Song, Myeong Gyu, 14

Song, Zhiyang, 1H

Souhaité, Aurélie, 0D

Su, Xiaojing, 1H

Su, Yajuan, 1H

Sugihara, Taro, 19

Szelag, Bertrand, 0D

Tabata, Osamu, 0F

Takada, Akira, 1C

Takahisa, Kenji, 27, 28

Takemasa, Kengo, 21

Tan, Chin Boon, 1Y

Tejnil, Edita, 0P

Thornes, Joshua, 18, 25

Timoshkov, Vadim, 09

Tomova, Zuleykhan, 0C

Tsai, Y. T., 1S

Tseng, C. F., 1F

Tsuchiya, Toshiyuki, 0F

Tsujita, Koichiro, 1U

Tsushima, Hiroaki, 1A, 1J

Tsuzuki, Takao, 1O

Tyminski, Jacek K., 0B

Uehara, Yusaku, 17

Ujazdowski, Richard, 26

van Ballegoij, Rob, 16

van der Heijden, Rob W., 08

van der Sanden, Stefan, 08

van Kempen, Floris, 0F

van Keulen, Fred, 0F

Verma, Piyush, 11

Viswanathan, Ramya, 0W

Vizioz, Christian, 0D

Voelkel, Reinhard, 0I, 1M

Vogler, Uwe, 0I, 1M

Wakamoto, Shinji, 19

Waller, Laura, 0O

Wang, Chenchen, 0J, 0T

Wang, Jinchun, 23

Wang, Jingyu, 11

Wang, Lei, 1L

Wang, Wuping, 21

Wang, Xiangzhao, 1E, 1L

Wang, Yan, 0J, 0T

Watanabe, Yuki, 10

Watts, Josef, 0W

Wehrung, Brian, 25

Wei, David, 0N, 0Q

Wei, Yayi, 1H

Weichelt, Tina, 0I

Weichselbaum, Stefan, 16

Weisbuch, François, 1T

Wiltshire, Timothy, 13

Wong, Patrick, 09

Woo, Youngtag, 0J

Wu, Cheng-En, 0N, 1Q

Wu, Wei-Chen, 0M

Wu, Yixu, 0T

Wyman, John, 25

Yaegashi, Hidetami, 1U

Yamauchi, Shohei, 1U

Yan, Guanyong, 1E, 1L

Yan, Qiliang, 0Q

Yang, Chaoxing, 1L

Yang, Elvis, 1F

Yang, Hyunjo, 1X

Yang, Qing, 1V, 1W

Yang, T. H., 1F

Yang, Wayne, 1Q

Yang, Zhengkai, 21

Yeung, Michael S., 0R

Yim, Donggyu, 1X

Yoo, Youngsun, 28

Yu, Bei, 0X

Yuan, Lei, 0J, 0T

Yun, Sang Ho, 12

Zeitner, Uwe D., 0E, 0I

Zeng, Jia, 0J

Zhang, Charlie, 0N

Zhang, Dong Qing, 1P, 1Y

Zhang, Hongbo, 0Q

Zhang, Hongxin, 1P

Zuniga, Christian, 1R

Zurita, Omar, 09, 1D

Conference Committee

Symposium Chair

  • Mircea V. Dusa, ASML US, Inc. (United States)

Symposium Co-chair

  • Bruce W. Smith, Rochester Institute of Technology (United States)

Conference Chair

  • Kafai Lai, IBM Corporation (United States)

Conference Co-chair

  • Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

Conference Program Committee

  • Pary Baluswamy, Micron Technology, Inc. (United States)

  • Peter D. Brooker, Synopsys, Inc. (United States)

  • Will Conley, Cymer, Inc. (United States)

  • Jo Finders, ASML Netherlands B.V. (Netherlands)

  • Carlos Fonseca, Tokyo Electron America, Inc. (United States)

  • Tsai-Sheng Gau, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

  • Bernd Geh, Carl Zeiss SMT Inc. (United States)

  • Yuri Granik, Mentor Graphics Corporation (United States)

  • Young Seog Kang, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Sachiko Kobayashi, Toshiba Corporation (Japan)

  • Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)

  • Soichi Owa, Nikon Corporation (Japan)

  • John S. Petersen, Periodic Structures, Inc. (United States)

  • Daniel Sarlette, Infineon Technologies Dresden (Germany)

  • Xuelong Shi, Semiconductor Manufacturing International Corporation (China)

  • Sam Sivakumar, Intel Corporation (United States)

  • Bruce W. Smith, Rochester Institute of Technology (United States)

  • Kazuhiro Takahashi, Canon Inc. (Japan)

  • Geert Vandenberghe, IMEC (Belgium)

  • Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)

Session Chairs

  • 1 Keynote Session

    Kafai Lai, IBM Corporation (United States)

    Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

  • 2 Pushing Optical Limit

    Bernd Geh, Carl Zeiss SMT Inc. (United States)

    Will Conley, Cymer LLC (United States)

  • 3 Image and Process Control

    Kazuhiro Takahashi, Canon Inc. (Japan)

    Carlos Fonseca, Tokyo Electron America, Inc. (United States)

  • 4 Non-IC Applications

    Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

    Reinhard Völkel, SUSS MicroOptics SA (Switzerland)

  • 5 Mask Topography: Joint Session with Conferences 9422 and 9426

    Ted Liang, Intel Corporation (United States)

    Hsu-Ting Huang, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan))

  • 6 Multiple Patterning and SMO

    Xuelong Shi, Semiconductor Manufacturing International Corporation (China)

    Emily Gallagher, IMEC (Belgium)

  • 7 Mask and Wafer Topography Modeling

    John S. Petersen, Periodic Structures, Inc. (United States)

    Young Seog Kang, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • 8 OPC and Modeling

    Yuri Granik, Mentor Graphics Corporation (United States)

    Peter D. Brooker, Synopsys, Inc. (United States)

  • 9 DFM (Design and Litho Optimization): Joint Session with Conferences 9426 and 9427

    Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)

    Andrew R. Neureuther, University of California, Berkeley (United States)

  • 10 Overlay Optimization: Joint Session with Conferences 9424 and 9426

    John C. Robinson, KLA-Tencor Corporation (United States)

    Mark Phillips, Intel Corportation (United States)

  • 11 DSA Design for Manufacturability: Joint Session with Conferences 9423, 9426, and 9427

    Michael A. Guillorn, IBM Thomas J. Watson Research Center (United States)

    Sachiko Kobayashi, Toshiba Corporation (Japan)

    Vivek K. Singh, Intel Corporation (United States)

  • 12 Toolings

    Soichi Owa, Nikon Corporation (Japan)

    Daniel Sarlette, Infineon Technologies Dresden (Germany)

© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 9426", Proc. SPIE 9426, Optical Microlithography XXVIII, 942601 (24 April 2015); doi: 10.1117/12.2193695; https://doi.org/10.1117/12.2193695
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