18 March 2015 Optical lithography with and without NGL for single-digit nanometer nodes
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This presentation addresses the challenges to pattern single-digit nanometer nodes. Next generation lithography such as Extreme UV, Multiple E-Beam Direct Write, may or may not help to meet the challenges. Optical lithography may still be needed for all layers, in combination with NGL for relevant layers, or not at all. The consideration will be based on necessary requirements such as overlay accuracy, resolution, and defects. However, even if all these requirements are met, only a satisfactory cost can dictate the application in high volume manufacturing. Some considerations on costs will also be presented.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Burn J. Lin, Burn J. Lin, "Optical lithography with and without NGL for single-digit nanometer nodes", Proc. SPIE 9426, Optical Microlithography XXVIII, 942602 (18 March 2015); doi: 10.1117/12.2087008; https://doi.org/10.1117/12.2087008


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