26 March 2015 Evolving optical lithography without EUV
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This talk will examine the evolutionary path of optical lithography without EUV. We explore the previous history to understand the various solutions that have emerged. This will give insight into future possibilities. We will examine the possible limits and fundamental problems moving into the sub-10nm node regime. Finally, the cost implications and future technologies are explored.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donis G. Flagello, Donis G. Flagello, Stephen P. Renwick, Stephen P. Renwick, } "Evolving optical lithography without EUV", Proc. SPIE 9426, Optical Microlithography XXVIII, 942604 (26 March 2015); doi: 10.1117/12.2086357; https://doi.org/10.1117/12.2086357


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