18 March 2015 Solution for high-order distortion on extreme illumination condition using computational prediction method
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Abstract
In this paper we present the limitations of 3rd order distortion corrections based on standard overlay metrology and propose a new method to quantify and correct the cold-lens aberration fingerprint. As a result of continuous shrinking features of the integrated circuit, the overlay budget requirements have become very demanding. Historically, most overlay enhancements were achieved by hardware improvements. However there also is a benefit in the computational approach, and so we looked for solutions for overlay improvements in process variation with computational applications.
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Young-Seog Kang, Young-Seog Kang, Hunhwan Ha, Hunhwan Ha, Jang-Sun Kim, Jang-Sun Kim, Ju Hee Shin, Ju Hee Shin, Young Ha Kim, Young Ha Kim, Young Sun Nam, Young Sun Nam, Young-Sin Choi, Young-Sin Choi, Cedric Affentauschegg, Cedric Affentauschegg, Rob W. van der Heijden, Rob W. van der Heijden, Umar Rizvi, Umar Rizvi, Bernd Geh, Bernd Geh, Eric Janda, Eric Janda, Jan Baselmans, Jan Baselmans, Stefan van der Sanden, Stefan van der Sanden, Oh-Sung Kwon, Oh-Sung Kwon, Mariya Ponomarenko, Mariya Ponomarenko, Daan Slotboom, Daan Slotboom, } "Solution for high-order distortion on extreme illumination condition using computational prediction method", Proc. SPIE 9426, Optical Microlithography XXVIII, 942608 (18 March 2015); doi: 10.1117/12.2086938; https://doi.org/10.1117/12.2086938
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