18 March 2015 Solution for high-order distortion on extreme illumination condition using computational prediction method
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Abstract
In this paper we present the limitations of 3rd order distortion corrections based on standard overlay metrology and propose a new method to quantify and correct the cold-lens aberration fingerprint. As a result of continuous shrinking features of the integrated circuit, the overlay budget requirements have become very demanding. Historically, most overlay enhancements were achieved by hardware improvements. However there also is a benefit in the computational approach, and so we looked for solutions for overlay improvements in process variation with computational applications.
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Young-Seog Kang, Hunhwan Ha, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, Young Sun Nam, Young-Sin Choi, Cedric Affentauschegg, Rob W. van der Heijden, Umar Rizvi, Bernd Geh, Eric Janda, Jan Baselmans, Stefan van der Sanden, Oh-Sung Kwon, Mariya Ponomarenko, Daan Slotboom, "Solution for high-order distortion on extreme illumination condition using computational prediction method", Proc. SPIE 9426, Optical Microlithography XXVIII, 942608 (18 March 2015); doi: 10.1117/12.2086938; https://doi.org/10.1117/12.2086938
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