Progresses in 300mm DUV photolithography for the development of advanced silicon photonic devices

Charles Baudot; Bertrand Szelag; Nacima Allouti; Corinne Comboroure; Sébastien Bérard-Bergery; Christian Vizioz; Sébastien Barnola; Fabien Gays; Denis Mariolle; Thomas Ferrotti; Aurélie Souhaité; Stéphane Brision; Christophe Kopp; Sylvie Menezo

doi:10.1117/12.2085800

Translator Disclaimer

18 March 2015 Progresses in 300mm DUV photolithography for the development of advanced silicon photonic devices

Charles Baudot, Bertrand Szelag, Nacima Allouti, Corinne Comboroure, Sébastien Bérard-Bergery, Christian Vizioz, Sébastien Barnola, Fabien Gays, Denis Mariolle, Thomas Ferrotti, Aurélie Souhaité, Stéphane Brision, Christophe Kopp, Sylvie Menezo

Author Affiliations +

Proceedings Volume 9426, Optical Microlithography XXVIII; 94260D (2015) https://doi.org/10.1117/12.2085800
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

In this paper we report on advances in DUV dry photolithography both for etching and implantation of silicon photonic devices. We explain why silicon patterning is a critical building block in silicon photonics and what are the challenges related to that process. Furthermore, it also occurs that some silicon photonic devices need implantation lithographic conditions which are also specific to the technology. For that purpose, we developed a dedicated DUV 193nm implantation lithography to address that need.

Citation Download Citation

Charles Baudot, Bertrand Szelag, Nacima Allouti, Corinne Comboroure, Sébastien Bérard-Bergery, Christian Vizioz, Sébastien Barnola, Fabien Gays, Denis Mariolle, Thomas Ferrotti, Aurélie Souhaité, Stéphane Brision, Christophe Kopp, and Sylvie Menezo "Progresses in 300mm DUV photolithography for the development of advanced silicon photonic devices", Proc. SPIE 9426, Optical Microlithography XXVIII, 94260D (18 March 2015); https://doi.org/10.1117/12.2085800

ACCESS THE FULL ARTICLE