Mask-induced best-focus-shifts in DUV and EUV lithography

Andreas Erdmann; Peter Evanschitzky; Jens Timo Neumann; Paul Gräupner

doi:10.1117/12.2086346

18 March 2015 Mask-induced best-focus-shifts in DUV and EUV lithography

Andreas Erdmann, Peter Evanschitzky, Jens Timo Neumann, Paul Gräupner

Proceedings Volume 9426, Optical Microlithography XXVIII; 94260H (2015) https://doi.org/10.1117/12.2086346
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The mask plays a significant role as an active optical element in lithography, for both EUV and immersion lithography. Mask-induced and feature dependent shifts of the best focus position and other aberration-like effects were reported both for deep ultraviolet (DUV) immersion and for EUV lithography. We employ rigorous computation of light diffraction from lithographic masks in combination with aerial image simulation to study the root causes of these effects and their dependencies from mask and optical system parameters. Special emphasis is put on the comparison of transmission masks for DUV lithography and reflective masks for EUV lithography, respectively.

Citation Download Citation

Andreas Erdmann, Peter Evanschitzky, Jens Timo Neumann, and Paul Gräupner "Mask-induced best-focus-shifts in DUV and EUV lithography", Proc. SPIE 9426, Optical Microlithography XXVIII, 94260H (18 March 2015); https://doi.org/10.1117/12.2086346

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available