Overlay improvement methods with diffraction based overlay and integrated metrology

Young-Sun Nam; Sunny Kim; Ju Hee Shin; Young Sin Choi; Sang Ho Yun; Young Hoon Kim; Si Woo Shin; Jeong Heung Kong; Young Seog Kang; Hun Hwan Ha

doi:10.1117/12.2087196

18 March 2015 Overlay improvement methods with diffraction based overlay and integrated metrology

Young-Sun Nam, Sunny Kim, Ju Hee Shin, Young Sin Choi, Sang Ho Yun, Young Hoon Kim, Si Woo Shin, Jeong Heung Kong, Young Seog Kang, Hun Hwan Ha

Author Affiliations +

Proceedings Volume 9426, Optical Microlithography XXVIII; 942612 (2015) https://doi.org/10.1117/12.2087196
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern’s behavior, but also the larger measurement samples are inevitable for minimizing statistical errors and better estimation of circumstance in a lot. From these reasons, diffraction based overlay (DBO) and integrated metrology (IM) were mainly proposed as new approaches for overlay enhancement in this paper.

Citation Download Citation

Young-Sun Nam, Sunny Kim, Ju Hee Shin, Young Sin Choi, Sang Ho Yun, Young Hoon Kim, Si Woo Shin, Jeong Heung Kong, Young Seog Kang, and Hun Hwan Ha "Overlay improvement methods with diffraction based overlay and integrated metrology", Proc. SPIE 9426, Optical Microlithography XXVIII, 942612 (18 March 2015); https://doi.org/10.1117/12.2087196

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