18 March 2015 Overlay improvement methods with diffraction based overlay and integrated metrology
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Abstract
To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern’s behavior, but also the larger measurement samples are inevitable for minimizing statistical errors and better estimation of circumstance in a lot. From these reasons, diffraction based overlay (DBO) and integrated metrology (IM) were mainly proposed as new approaches for overlay enhancement in this paper.
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Young-Sun Nam, Young-Sun Nam, Sunny Kim, Sunny Kim, Ju Hee Shin, Ju Hee Shin, Young Sin Choi, Young Sin Choi, Sang Ho Yun, Sang Ho Yun, Young Hoon Kim, Young Hoon Kim, Si Woo Shin, Si Woo Shin, Jeong Heung Kong, Jeong Heung Kong, Young Seog Kang, Young Seog Kang, Hun Hwan Ha, Hun Hwan Ha, } "Overlay improvement methods with diffraction based overlay and integrated metrology", Proc. SPIE 9426, Optical Microlithography XXVIII, 942612 (18 March 2015); doi: 10.1117/12.2087196; https://doi.org/10.1117/12.2087196
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