In this paper, we present the insight for the wafer-based overlay correction with optimal measurement resource which is suitable for mass production. The experiment which is the wafer-based overlay correction by several statistical analyses carried out for 2X nm node DRAM. Among them, linear regression is a strong candidate for wafer-based overlay control, which improved up to 0.8 nm of maximum overlay.
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Byeong Soo Lee, Young Seog Kang, Jeong Heung Kong, Hyun Woo Hwang, Myeong Gyu Song, "Wafer to wafer overlay control algorithm implementation based on statistics," Proc. SPIE 9426, Optical Microlithography XXVIII, 942614 (26 March 2015);