18 March 2015 Performance of ETC controller in high-volume production
Author Affiliations +
As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost of ownership. In particular, the ETC controller provides improved spectral bandwidth and wavelength stability, which enables superior CD control and wafer yield for the chipmaker. This controller is a key technology in Cymer’s XLR 700ix and DynaPulseTM products. Last year we reported that the XLR 600ix incorporates new controller technology called ETC for improvements in spectral bandwidth and wavelength stability. The Authors will present metrics demonstrating the performance and stability of systems that have been installed at chipmaker sites over the last year.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joshua Thornes, Joshua Thornes, Kevin O'Brien, Kevin O'Brien, Hoang Dao, Hoang Dao, David Dunlap, David Dunlap, Ronnie Flores, Ronnie Flores, Matt Lake, Matt Lake, Aleks Simic, Aleks Simic, Brian Wehrung, Brian Wehrung, John Wyman, John Wyman, Will Conley, Will Conley, "Performance of ETC controller in high-volume production", Proc. SPIE 9426, Optical Microlithography XXVIII, 942625 (18 March 2015); doi: 10.1117/12.2086102; https://doi.org/10.1117/12.2086102

Back to Top