22 April 2015 Front Matter: Volume 9427
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 9427, including the Title Page, Copyright information, Table of Contents, Authors, Introduction (if any), and Conference Committee listing.
Sturtevant and Capodieci: Front Matter: Volume 9427

The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from this book:

Author(s), “Title of Paper,” in Design-Process-Technology Co-optimization for Manufacturability IX, edited by John L. Sturtevant, Luigi Capodieci, Proceedings of SPIE Vol. 9427 (SPIE, Bellingham, WA, 2015) Article CID Number.

ISSN: 0277-786X

ISBN: 9781628415292

Published by

SPIE

P.O. Box 10, Bellingham, Washington 98227-0010 USA

Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445

SPIE.org

Copyright © 2015, Society of Photo-Optical Instrumentation Engineers.

Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/15/$18.00.

Printed in the United States of America.

Publication of record for individual papers is online in the SPIE Digital Library.

00001_psisdg9427_942701_page_2_1.jpg

Paper Numbering: Proceedings of SPIE follow an e-First publication model, with papers published first online and then in print. Papers are published as they are submitted and meet publication criteria. A unique citation identifier (CID) number is assigned to each article at the time of the first publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online, print, and electronic versions of the publication. SPIE uses a six-digit CID article numbering system in which:

  • The first four digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc.

The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages.

Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc.

Adam, Kostas, 10

Arikati, Srini, 0A

Aytuna, Burak, 0U

Badr, Yasmine, 0P

Bahnas, Mohamed, 10

Bahr, Mohamed, 15

Batarseh, Fadi, 12

Bömmels, Jürgen, 0C

Brunet, Jean-Marie, 03

Burbine, Andrew, 0J

Capodieci, Luigi, 04, 0Q, 0T, 12

Casati, Nathalie, 06

Chang, Jinman, 13

Chava, Bharani, 09, 0C, 0E

Cheilaris, Panagiotis, 06

Chen, Yijian, 0G, 0M, 0W, 14

Cheng, Qi, 0M, 0W

Choi, Bumjin, 13

Choi, Heon, 0I

Choi, Junghoe, 0D

Choi, Soo-Han, 0A

Chu, Albert, 02

Cilingir, Erdem, 0A

Cline, Brian, 07

Cote, Michel, 0F

Crouse, Michael, 0Z

Culp, James, 10

Dai, Vito, 04, 0Q

Debacker, Peter, 0E

Dechene, Dan J., 0Z

Deng, ZeXi Rock, 0R, 0Y

Dey, Sandeep Kumar, 06

Ding, Hua, 0F, 0R

Do, Munhoe, 0D

Du, ChunShan, 0Y

Dusa, Mircea, 0E, 0O

ElManhawy, Wael, 03

Elsaid, Ahmad, 0E

Endo, Toshikazu, 10

Feldman, Nelly, 05

Fryer, David, 0J

Gabrani, Maria, 06

Gao, Jhih-Rong, 0S

Gerousis, V., 09

Ghulghazaryan, Ruben, 0U

Gillijns, Werner, 09, 0E

Gronlund, Keith, 0Z

Gupta, Puneet, 0P

Gupta, Rachit, 0H

Gutwin, Paul, 02

Hamouda, Ayman, 0X, 0Z

Han, Daehan, 13

Han, Ting, 14

Hashimoto, Takaki, 0K

Hong, Aeran, 13

Hong, Chuyang, 0W

Hong, Hyeongsun, 13

Hong, Lin, 0Y

Hong, Sid, 0R

Hsu, Stephen, 0Z

Huang, Jason, 0F, 0R

Hui, Colin, 0U, 0V

Hurat, Philippe, 0F

Jantzen, Kenneth, 11

Jin, Gyoyoung, 13

Jun, Jinhyuck, 0D

Kallingal, Chidam, 0I

Kang, Jae-hyun, 03

Kang, Jinyoung, 13

Katakamsetty, Ushasree, 0U, 0V

Kim, Min-Soo, 0O

Kim, NamJae, 03

Kim, Stephen, 11

Kim, Taeheon, 13

Kim, Taehoon, 0D

Kim, Yonghyeon, 13

Kodama, Chikaaki, 08, 0B

Kohira, Yukihide, 0B

Koli, Dinesh, 0U

Kotani, Toshiya, 08, 0K

Krishnamoorthy, Karthik N., 0Q

Kwan, Joe, 03

Kwon, Steve, 03

Lafferty, Neal, 10

Lai, Ya-Chieh, 0F, 0Q, 0R

Lamba, Gurpreet Singh, 10

Le Denmat, Jean-Christophe, 05

Lee, Dongchan, 0D

Lee, Joosung, 13

Lee, Jooyoung, 13

Lee, Kweonjae, 13

Lee, Kyupil, 13

Lee, Kyusun, 13

Leray, Philippe, 0C

Lewis, Travis, 11

Li, Helen, 0F

Li, Pengcheng, 0Z

Liebmann, Lars, 02

Liu, Hongyi, 0G, 14

Luk-Pat, Gerard, 0D

Ma, Yuansheng, 0P

Madhavan, Sriram, 04, 0T, 12

Madkour, Kareem, 03

Mallik, Arindam, 0C

Matsui, Tomomi, 0B

Matsunawa, Tetsuaki, 0S

McGinty, Chris, 10

McIntyre, Gregory R., 09, 0C

Meiring, Jason, 10

Mercha, Abdelkarim, 09, 0C, 0E, 0O

Miloslavsky, Alex, 0D

Mitra, Joydeep, 0P

Mocuta, Dan, 0O

Mountsier, Tom, 0O

Nakajima, Fumiharu, 08

Nakayama, Koichi, 08

Nojima, Shigeki, 08, 0B, 0K

O'Neill, Joseph, 10

Pack, Robert C., 12

Paek, Seung Weon, 03

Pan, David Z., 07, 0S

Papadopoulou, Evanthia, 06

Park, Chanha, 0D

Park, Jinho, 03

Park, Minwoo, 0D

Park, Minyoung, 11

Pathak, Piyush, 0T

Raghavan, Praveen, 09, 0C, 0E

Riewer, Olivia, 05

Rio, David, 0E

Ronse, Kurt G., 09, 0C

Russell, Gordon, 11

Ryckaert, Julien, 09, 0C, 0E, 0O

Sakanushi, Keishi, 0K

Sakhare, Sushil S., 0C, 0O

Salama, Mohamed, 0X

Samboju, Nagaraj Chary, 0A

Schuddinck, Pieter, 0C

Schumacher, Dan, 10

Shafee, Marwah, 03

Shang, Shumay, 0H

Sherazi, S. M. Y., 09

Sherazi, Yasser, 0C, 0E

Shokeen, Lalit, 0Z

Simmons, Mark, 11

Somani, Shikha, 0T, 12

Song, Huiyuan, 0F

Steegen, An, 0C

Sturtevant, John, 0H, 0J, 10

Suzor, Christophe, 05

Sweis, Jason, 0Q, 0R

Takahashi, Atsushi, 0B

Talluto, Salvatore, 05

Tanaka, Satoshi, 0B

Tawada, Masashi, 0K

Teoh, Edward, 0Q

Terry, Mark, 0Z

Thean, Aaron, 0C, 0O

Togawa, Nozomu, 0K

Tökei, Zsolt, 0C

Torres, J. Andres, 0P

Tripathi, Vikas, 0V

Trivkovic, Darko, 09, 0E, 0O

Trong, Huynh Bao, 0C

Vallet, Michel, 05

Vandewalle, B., 09

Veeraraghavan, Vijay, 11

Verkest, Diederik, 09, 0C, 0E, 0O

Verma, Piyush, 0T, 12

Wang, Jinyan, 0R, 0Y

Wang, Lynn T.-N., 04

Wang, Pu, 0W

Wang, Wei-long, 0I

Wawrzynski, Glenn, 10

Wilson, Jeff, 0U

Wong, Waisum, 0F

Xu, Ji, 0Q

Xu, Wei, 0F

Xu, Xiaoqing, 07

Yanagisawa, Masao, 0K

Yang, Hyunjo, 0D

Yeo, Sky, 0U, 0V

Yeom, Kyehee, 13

Yeric, Greg, 07

Yesilada, Emek, 05

Yim, Donggyu, 0D

Yu, Bei, 07, 0S

Zhang, Gary, 0Z

Zhang, LiGuo, 0Y

Zhang, Mealie, 0F

Zhang, Yifan, 0F, 0R

Zhou, Jun, 0G, 14

Zou, Elain, 0R

Conference Committee

Symposium Chair

  • Mircea V. Dusa, ASML US, Inc. (United States)

Symposium Co-chair

  • Bruce W. Smith, Rochester Institute of Technology (United States)

Conference Chair

  • John L. Sturtevant, Mentor Graphics Corporation (United States)

Conference Co-chair

  • Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)

Conference Program Committee

  • Robert Aitken, ARM, Inc. (United States)

  • Jason P. Cain, Advanced Micro Devices, Inc. (United States)

  • Fang-Cheng Chang, Cadence Design Systems, Inc. (United States)

  • Lars W. Liebmann, IBM Corporation (United States)

  • Ru-Gun Liu, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

  • Mark E. Mason, Texas Instruments Inc. (United States)

  • Andrew R. Neureuther, University of California, Berkeley (United States)

  • Shigeki Nojima, Toshiba Corporation (Japan)

  • David Z. Pan, The University of Texas at Austin (United States)

  • Chul-Hong Park, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Michael L. Rieger, Synopsys, Inc. (United States)

  • Vivek K. Singh, Intel Corporation (United States)

  • Chi-Min Yuan, Freescale Semiconductor, Inc. (United States)

Session Chairs

  • 1 Invited Session I

    • John L. Sturtevant, Mentor Graphics Corporation (United States)

    • Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)

  • 2 Layout Patterns Applications

    • John L. Sturtevant, Mentor Graphics Corporation (United States)

    • Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)

  • 3 Multipatterning

    • Lars W. Liebmann, IBM Corporation (United States)

    • Shigeki Nojima, Toshiba Corporation (Japan)

  • 4 Invited Session II

    • Robert Aitken, ARM, Inc. (United States)

    • Michael L. Rieger, Synopsys, Inc. (United States)

  • 5 Layout Optimization and Verification I

    • Robert Aitken, ARM, Inc. (United States)

    • Michael L. Rieger, Synopsys, Inc. (United States)

  • 6 Design Interaction with Metrology: Joint Session with Conference 9424

    • Alexander Starikov, I&I Consulting (United States)

    • Jason P. Cain, Advanced Micro Devices, Inc. (United States)

  • 7 DFM (Design and Litho Optimization): Joint Session with Conference 9426

    • Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)

    • Andrew R. Neureuther, University of California, Berkeley (United States)

  • 8 Invited Session III

    • Chi-Min Yuan, Freescale Semiconductor, Inc. (United States)

    • Ru-Gun Liu, Taiwan Semiconductor Manufacturing Company, Ltd. (Taiwan)

  • 9 Circuit Variability

    • Chi-Min Yuan, Freescale Semiconductor, Inc. (United States)

    • Hsu-Ting Huang, Taiwan Semiconductor Manufacturing Company, Ltd. (United States)

  • 10 DSA Design for Manufacturability: Joint Session with Conferences 9423 and 9426

    • Michael A. Guillorn, IBM Thomas J. Watson Research Center (United States)

    • Sachiko Kobayashi, Toshiba Corporation (Japan)

    • Vivek K. Singh, Intel Corporation (United States)

  • 11 Layout and Optimization and Verification II

    • Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)

    • Chul-Hong Park, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

    • David Z. Pan, The University of Texas at Austin (United States)

© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 9427", Proc. SPIE 9427, Design-Process-Technology Co-optimization for Manufacturability IX, 942701 (22 April 2015); doi: 10.1117/12.2193828; https://doi.org/10.1117/12.2193828
PROCEEDINGS
12 PAGES


SHARE
Back to Top